The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2022

Filed:

Feb. 28, 2020
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Asaf Regev, Ramat Gan, IL;

Christopher Berry, Hudson, NY (US);

Ofer Geva, Poughkeepsie, NY (US);

Amit Amos Atias, Tel Aviv, IL;

Timothy A. Schell, Cary, NC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 29/66 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10894 (2013.01); H01L 27/10897 (2013.01); H01L 28/40 (2013.01); H01L 29/66181 (2013.01);
Abstract

A method for distributing deep trench (DT) capacitance in an integrated circuit (IC) design is provided. The method includes forming a placement block that includes blockages defining openings in interstitial regions among the blockages, superimposing the placement block over the IC design and providing distributed DT capacitance to the IC design. The providing of the distributed DT capacitance includes adding DT capacitance cells through the openings to portions of the IC design where there are no reserved blocks.


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