The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2022
Filed:
Feb. 07, 2020
Applicant:
Kokusai Electric Corporation, Tokyo, JP;
Inventors:
Tsuyoshi Takeda, Toyama, JP;
Tatsuya Nishino, Toyama, JP;
Assignee:
KOKUSAI ELECTRIC CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01); C23C 16/52 (2006.01); H05H 1/00 (2006.01); H05H 1/46 (2006.01); H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); C23C 16/52 (2013.01); H01J 37/32449 (2013.01); H01J 37/32935 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02211 (2013.01); H01L 21/02274 (2013.01); H01L 21/31 (2013.01); H05H 1/00 (2013.01); H05H 1/0025 (2013.01); H05H 1/46 (2013.01); H01J 2237/3151 (2013.01);
Abstract
There is provided a technique that includes: imaging a gas supply hole configured to supply a plasma-converted gas into a process chamber by using an imaging device disposed in the process chamber; detecting a plasma emission intensity based on an image of the imaged gas supply hole; and determining at least one of whether abnormal plasma discharge has occurred and whether plasma flickering has occurred based on the detected plasma emission intensity.
Takeda, Tsuyoshi. (2022). Method of determining plasma abnormality, method of manufacturing semiconductor device, and substrate processing apparatus (U.S. Patent No. 11295959). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11295959
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile