The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2022

Filed:

Sep. 05, 2017
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventor:

Shingo Kanamitsu, Kanagawa, JP;

Assignee:

KIOXIA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); B29C 59/16 (2006.01); B29C 33/42 (2006.01); B29C 43/14 (2006.01); B29C 33/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/301 (2013.01); B29C 33/424 (2013.01); B29C 43/146 (2013.01); B29C 59/16 (2013.01); G03F 7/0035 (2013.01); G03F 7/0043 (2013.01);
Abstract

A template manufacturing method includes preparing a structure including a first substrate and a stacked body that is provided on the first substrate, the stacked body including a first lower layer including a first material, a first upper layer provided on the first lower layer including a second material different from the first material, and a first cover layer provided on a first cover region of the first upper layer and including a third material different from the second material. The method further includes forming a first resist layer on a portion of the first cover layer and on a first portion of the first upper layer, and exposing a second portion of the upper layer. The method yet further includes removing the second portion of the first upper layer using the first cover layer and the first resist layer as a mask.


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