The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2022
Filed:
Dec. 16, 2019
Applicant:
Innolux Corporation, Miao-Li County, TW;
Inventors:
Chien-Hsing Lee, Miao-Li County, TW;
Chin-Lung Ting, Miao-Li County, TW;
Jung-Chuan Wang, Miao-Li County, TW;
Hong-Sheng Hsieh, Miao-Li County, TW;
Assignee:
INNOLUX CORPORATION, Miao-Li County, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/60 (2013.01);
Abstract
A method for forming a mask substrate is provided. The method includes providing a first base and providing a mask layer on the first base. The method also includes patterning the mask layer to form a pattern, wherein the first base and the pattern form a patterned substrate and providing a first substrate. The method further includes providing an optical layer on the first substrate or on the patterned substrate and assembling the first substrate and the patterned substrate to form the mask substrate.