The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2022

Filed:

Mar. 10, 2021
Applicant:

Galvanic Applied Sciences Inc., Calgary, CA;

Inventors:

David D. Haydt, Calgary, CA;

Michael B. Frish, Andover, MA (US);

Shin-Juh Chen, Andover, MA (US);

Nicholas F. Aubut, Andover, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/25 (2006.01); G01N 21/39 (2006.01);
U.S. Cl.
CPC ...
G01N 21/39 (2013.01); G01N 21/255 (2013.01); G01N 2201/06113 (2013.01);
Abstract

Systems and method for analysing contaminants of a gas sample of natural gas are provided. An interrogation light beam propagates into a chamber of a multipass gas cell receiving the gas sample. The interrogation light beam has a wavelength controlled to alternately correspond to an absorption wavelength of HS and an absorption wavelength of an additional gas contaminant. The additional gas contaminant may for example be COor HO. In some implementation, a single laser emitter may be used to generate the interrogation light beam at the HS and COwavelengths. In some implementations, two different laser emitters may be used to generate the interrogation light beam at the HS and HO wavelengths. A WMS detection scheme may be used.


Find Patent Forward Citations

Loading…