The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Sep. 21, 2018
Applicant:

Lg Innotek Co., Ltd., Seoul, KR;

Inventors:

Hyo Yun Jung, Seoul, KR;

Dong Keun Lee, Seoul, KR;

Ju Yeon Won, Seoul, KR;

Seok Bae, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02K 21/16 (2006.01); H02K 1/278 (2022.01);
U.S. Cl.
CPC ...
H02K 1/278 (2013.01); H02K 21/16 (2013.01);
Abstract

An embodiment provides a motor comprising: a stator including a through hole; a cylindrical rotor which is disposed in the through hole; a rotor center shaft which is formed in the central region of the rotor and to which a rotary shaft is coupled; and a first magnet and a second magnet which are disposed between the stator and the rotor, wherein: the rotor includes an outer contour portion and a patterned portion formed between the outer contour portion and the rotor center shaft; the patterned portion includes a plurality of unit patterns and a hollow portion formed in each of the unit patterns; the outer contour portion includes an outer circumferential surface on which the first magnet and the second magnet are disposed and an inner circumferential surface which comes in contact with the plurality of unit patterns; the inner circumferential surface of the outer contour portion further includes a first protrusion portion protruding in a first direction toward the rotor center shaft; and in the first direction, the maximum length of the first protrusion portion is greater than the maximum length of each of the unit patterns.


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