The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Dec. 17, 2019
Applicant:

Ecole Polytechnique Federale DE Lausanne (Epfl), Lausanne, CH;

Inventors:

Mihai Adrian Ionescu, Ecublens, CH;

Francesco Bellando, Renens, CH;

Ali Saeidi, Ecublens, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); G01N 27/414 (2006.01); H01L 29/66 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78391 (2014.09); G01N 27/4145 (2013.01); H01L 29/513 (2013.01); H01L 29/6684 (2013.01); H01L 29/66568 (2013.01);
Abstract

A semiconductor sensor includes a source element; a drain element; and a semiconductor channel element between the source element and the drain element, forming an electrically conductive channel. An insulator is positioned between the semiconductor channel element and a solution to be sensed. A reference contacts the solution and sets an electric potential of the solution. A bias voltage source generates an external sensor bias voltage for electrically biasing the reference electrode. A sensing surface interacts with the solution comprising analytes for generating a surface potential change at the sensing surface dependent on the concentration of analytes. The sensor further includes a ferroelectric capacitance element between the insulator and the bias voltage source for generating a negative capacitance for a differential gain between the external sensor bias voltage and an internal sensor bias voltage sensed at a surface of the channel element facing the insulator or ferroelectric capacitance element.


Find Patent Forward Citations

Loading…