The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
May. 31, 2019
Seoul National University R&db Foundation, Seoul, KR;
Hodooai Lab Inc., Seoul, KR;
Jungwoo Lee, Seoul, KR;
Kihun Kim, Seoul, KR;
Seoul National University R&DB Foundation, Seoul, KR;
hodooAI Lab Inc., Seoul, KR;
Abstract
Provided is an apparatus for training a facial-locality super resolution deep neural network, the apparatus including a generator configured to receive a low-resolution image and convert the received low-resolution image into a fake high-resolution image similar to an original high-resolution image, a discriminator configured to compare the fake high-resolution image output from the generator with the original high-resolution image to determine authenticity, and a facial-locality loss term configured to calculate a loss that is to be minimized by the generator according to the authenticity output from the discriminator, wherein the generator is an artificial neural network learning model that learns while adjusting a weight to minimize the loss, and the facial-locality loss term calculates the loss of the generator by reflecting pixel information about a feature region of a face.