The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Jan. 30, 2020
Applicant:
Reservoir Labs, Inc., New York, NY (US);
Inventors:
Pierre-David Letourneau, Long Island, NY (US);
Mitchell Harris, New York, NY (US);
Assignee:
Reservoir Labs, Inc., New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 22/00 (2006.01); G01N 27/22 (2006.01); G01N 27/04 (2006.01); G01N 27/72 (2006.01); G01N 23/20 (2018.01); G01N 23/00 (2006.01); G01N 22/02 (2006.01); G06T 11/00 (2006.01); G01V 3/30 (2006.01);
U.S. Cl.
CPC ...
G01N 22/00 (2013.01); G01N 23/00 (2013.01); G01N 23/20 (2013.01); G01N 27/04 (2013.01); G01N 27/221 (2013.01); G01N 27/72 (2013.01); G01N 22/02 (2013.01); G01N 27/22 (2013.01); G01V 3/30 (2013.01); G06T 11/003 (2013.01);
Abstract
A technique for measuring properties of a material includes measuring the electromagnetic radiation scattered by one or more scattering points associated with the material, and adjusting the radiation according to the respective sensitivities of the scattering points to changes in material properties at that scattering point for several pairs of radiation sources and receivers. The material properties are determined using the updated measurements and corresponding simulated measurements.