The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

May. 18, 2017
Applicants:

Ohara Quartz Co., Ltd., Wakayama, JP;

National University Corporation Nagaoka University of Technology, Nagaoka, JP;

National Institute of Technology, Hachioji, JP;

Inventors:

Masahiko Inui, Wakayama, JP;

Sunao Chatani, Wakayama, JP;

Motohiro Tagaya, Nagaoka, JP;

Satoshi Motozuka, Motosu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/00 (2006.01); C12N 5/077 (2010.01); C12M 3/00 (2006.01); C12N 1/00 (2006.01);
U.S. Cl.
CPC ...
C12M 23/02 (2013.01); C12M 3/00 (2013.01); C12M 23/20 (2013.01); C12N 1/00 (2013.01); C12N 5/0654 (2013.01); C12N 2533/00 (2013.01); C12N 2533/10 (2013.01); C12N 2533/14 (2013.01); C12N 2535/00 (2013.01);
Abstract

The purpose of the present invention is to provide a cell culture substratum which has excellent resistance to liquid culture media and low cytotoxicity, can achieve a high cell adhesion ratio and a high viability of cultured cells, has excellent thermal stability, and is less likely to absorbs ultraviolet ray. A cell culture substratum which is provided with a substrate made from an inorganic material and has multiple concavo-convex structures on a culturing surface thereof, wherein, when the concavo-convex structures are measured with an atomic force microscope in accordance with JISB0601 and JISR1683 (measured area: a 1 μm-square, cut-off value of a low-pass contour curve filter: 1 nm, cut-off value of a high-pass contour curve filter: 170 nm), the average of the lengths of contour curve elements of the concavo-convex structures is 1 to 170 nm as measured in at least one direction (when a curve showing long-wavelength components that are blocked by the high-pass contour curve filter is converted to a straight line by the least square method, the average line is a line that is parallel with the straight line and indicates a height cumulative relative frequency distribution in the contour curve of 50%).


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