The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Feb. 12, 2020
Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Jong Hyuk Park, Seoul, KR;

Min Park, Seoul, KR;

Tae Ann Kim, Seoul, KR;

Jongwon Kim, Seoul, KR;

Sung Min Jee, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07B 61/00 (2006.01); C07C 277/00 (2006.01); C07D 247/02 (2006.01); C08G 59/24 (2006.01); C08G 59/50 (2006.01); C09J 163/00 (2006.01);
U.S. Cl.
CPC ...
C08G 59/5006 (2013.01); C07B 61/00 (2013.01); C07C 277/00 (2013.01); C07D 247/02 (2013.01); C08G 59/245 (2013.01); C08G 59/50 (2013.01); C09J 163/00 (2013.01);
Abstract

A method for preparing a latent hardener includes, in the order recited, introducing a hardener into a dry mixer that is a high-energy-type mixer; injecting carbon dioxide gas or an inert gas into the dry mixer; and mechanochemically deactivating only a surface of the hardener using the dry mixer. The hardener may be an amine-based adduct, an imidazole-based adduct, dicyandiamide, a dihydride-based compound, a dichlorophenyl dimethylurea compound and combinations thereof. The inert gas may be helium, nitrogen, argon, neon, krypton, and combinations thereof.


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