The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Nov. 22, 2019
Applicant:

Intraop Medical Corporation, Sunnyvale, CA (US);

Inventors:

Donald A. Goer, Sunnyvale, CA (US);

Alexandre S. Kretchetov, San Jose, CA (US);

David H. Whittum, Sunnyvale, CA (US);

James A. Nelson, Newark, CA (US);

Assignee:

INTRAOP MEDICAL CORPORATION, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01);
U.S. Cl.
CPC ...
A61N 5/1067 (2013.01); A61N 5/1049 (2013.01); A61N 2005/1059 (2013.01); A61N 2005/1074 (2013.01); A61N 2005/1089 (2013.01); A61N 2005/1095 (2013.01);
Abstract

The present invention provides electron beam therapies with improved feedback control that delivers controlled and adjustable doses of electron beam radiation to variable shallow depths with little radiation exposure to both nearby tissues and tissues below the target. In order to control radiation to accurately penetrate to shallow depths and to allow the radiation to be adjusted to other depth settings in very small or even continuous increments, the present invention senses a plurality of different electron beam characteristics and then uses these to derive a composite characteristic, or analog, of the electron beam energy. The composite analog provides a strong correlation to energy that allows this precision. In another aspect, the present invention relates to implementing this feedback control by adjusting power levels used to establish the electron beam. In other embodiments, feedback control adjusts absorbing components with variable electron beam absorption depending on how such components are presented to the electron beam.


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