The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

May. 15, 2018
Applicant:

Hamilton Sundstrand Corporation, Charlotte, NC (US);

Inventors:

John W. Steele, New Hartford, CT (US);

Peter A. Canga, League City, TX (US);

Barbara M. Peyton, Windsor, CT (US);

Tony Rector, East Granby, CT (US);

Douglas Zupan, La Porte, TX (US);

Assignee:

HAMILTON SUNDSTRAND CORPORATION, Charlotte, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 7/00 (2006.01); B01D 7/00 (2006.01); B64G 6/00 (2006.01); C02F 9/00 (2006.01); F24F 5/00 (2006.01); C02F 1/00 (2006.01); C02F 1/28 (2006.01); C02F 1/50 (2006.01); C02F 101/32 (2006.01); C02F 101/34 (2006.01); C02F 103/02 (2006.01);
U.S. Cl.
CPC ...
A61F 7/0085 (2013.01); B01D 7/00 (2013.01); B64G 6/00 (2013.01); C02F 9/005 (2013.01); F24F 5/0035 (2013.01); A61F 2007/0056 (2013.01); C02F 1/001 (2013.01); C02F 1/283 (2013.01); C02F 1/50 (2013.01); C02F 2101/322 (2013.01); C02F 2101/34 (2013.01); C02F 2101/40 (2013.01); C02F 2103/023 (2013.01); C02F 2303/04 (2013.01);
Abstract

A thermal management system includes a space structure, a feed water container, a water feed line, a pump, and a filter device. The space structure includes a heat source connected with a fluid loop for conveying a working fluid through the heat source to regulate temperature and a sublimator connected with the fluid loop to receive the working fluid. The sublimator has a porous surface. The water feed line is connected with the container and the sublimator. The pump is located in the feed water line and is operable to move the feed water from the container to the sublimator. The sublimator is operable to cool the working fluid using the porous surface. The filter device is located in the water feed line between the pump and the feed water container. The filter device includes an adsorbent bed to remove organic compounds.


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