The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

Dec. 07, 2018
Applicant:

Sony Corporation, Tokyo, JP;

Inventors:

Atsushi Ito, Kanagawa, JP;

Ilya Reshetouski, Tokyo, JP;

Assignee:

SONY CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/232 (2006.01); H04N 5/341 (2011.01);
U.S. Cl.
CPC ...
H04N 5/23229 (2013.01); H04N 5/341 (2013.01);
Abstract

The present disclosure relates to an image-capturing apparatus, an image-capturing method, and an image-capturing device that allow reduction of an influence of diffraction due to opening sections of a mask in lensless image-capturing. Before a mask, a band-pass filter that is divided into a plurality of areas, each of which transmits incident light in a different wavelength band, is provided, and the mask that includes opening sections, and modulates the incident light, which has been transmitted through the band-pass filter, in the wavelength bands that are different for the individual areas is provided. The opening sections of the mask have such unit sizes that blurring resulting from diffraction which occurs to each wavelength of the incident light is minimized. The present disclosure can be applied to a lensless image-capturing apparatus.


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