The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

Nov. 09, 2020
Applicant:

Resonant Inc., Goleta, CA (US);

Inventors:

Patrick Turner, San Bruno, CA (US);

Ryo Wakabayashi, Santa Clara, CA (US);

Assignee:

Resonant Inc., Austin, TX (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 9/17 (2006.01); H03H 3/02 (2006.01); H03H 9/13 (2006.01); H03H 9/02 (2006.01); H03H 9/56 (2006.01); H03H 9/205 (2006.01); H03H 9/54 (2006.01);
U.S. Cl.
CPC ...
H03H 9/174 (2013.01); H03H 3/02 (2013.01); H03H 9/02015 (2013.01); H03H 9/02031 (2013.01); H03H 9/02228 (2013.01); H03H 9/132 (2013.01); H03H 9/176 (2013.01); H03H 9/205 (2013.01); H03H 9/547 (2013.01); H03H 9/562 (2013.01); H03H 9/564 (2013.01); H03H 9/568 (2013.01); H03H 2003/023 (2013.01);
Abstract

An acoustic resonator is fabricated by forming a patterned first photoresist mask on a piezoelectric plate at locations of a desired interdigital transducer (IDT) pattern. An etch-stop layer is then deposited on the plate and first photoresist mask. The first photoresist mask is removed to remove parts of the etch-stop and expose the plate. An IDT conductor material is deposited on the etch stop and the exposed plate. A patterned second photoresist mask is then formed on the conductor material at locations of the IDT pattern. The conductor material is then etched over and to the etch-stop to form the IDT pattern which has interleaved fingers on a diaphragm to span a substrate cavity. A portion of the plate and the etch-stop form the diaphragm. The etch-stop and photoresist mask are impervious to this etch. The second photoresist mask is removed to leave the IDT pattern.


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