The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
Apr. 19, 2019
Applicant:
Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;
Inventors:
Assignee:
SEMICONDUCTOR ENERGY LABORATORY CO., LTD., Kanagawa-ken, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/00 (2006.01); H01M 4/58 (2010.01); C01D 15/02 (2006.01); C01G 45/00 (2006.01); C01G 49/00 (2006.01); C01G 51/00 (2006.01); C01G 53/00 (2006.01); C30B 7/10 (2006.01); H01M 4/36 (2006.01); H01M 4/587 (2010.01); C30B 29/14 (2006.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/5825 (2013.01); C01D 15/02 (2013.01); C01G 45/006 (2013.01); C01G 49/009 (2013.01); C01G 51/006 (2013.01); C01G 53/006 (2013.01); C30B 7/10 (2013.01); H01M 4/364 (2013.01); H01M 4/587 (2013.01); C30B 29/14 (2013.01); H01M 2004/028 (2013.01); H01M 2220/30 (2013.01);
Abstract
An object is to reduce variation in shape of crystals that are to be formed. Solutions containing respective raw materials are made in an environment where an oxygen concentration is lower than that in air, the solutions containing the respective raw materials are mixed in an environment where an oxygen concentration is lower than that in air to form a mixture solution, and with use of the mixture solution, a composite oxide is formed by a hydrothermal method.