The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

Aug. 07, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sushant S. Koshti, Sunnyvale, CA (US);

Dean C. Hruzek, Cedar Park, TX (US);

Ayan Majumdar, San Jose, CA (US);

John C. Menk, Round Rock, TX (US);

Helder T. Lee, San Jose, CA (US);

Sangram Patil, Sunnyvale, CA (US);

Sanjay Rajaram, Sunnyvale, CA (US);

Douglas Baumgarten, Round Rock, TX (US);

Nir Merry, Mountain View, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67207 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/67772 (2013.01);
Abstract

A factory interface for an electronic device processing system includes a factory interface chamber, an inert gas supply conduit, an exhaust conduit and an inert gas recirculation system. The inert gas supply conduit supplies an inert gas into the factory interface chamber. The exhaust conduit exhausts the inert gas from the factory interface chamber. The inert gas recirculation system recirculates the inert gas exhausted from the factory interface chamber back into the factory interface chamber.


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