The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

Dec. 05, 2017
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Joshua M. Susskind, San Jose, CA (US);

Feng Tang, Cupertino, CA (US);

Chen Huang, Columbia, MO (US);

Shih-Yu Sun, Cupertino, CA (US);

Walter A. Talbot, Cupertino, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/0488 (2013.01); G06N 20/00 (2019.01); G06F 3/04883 (2022.01); G06N 5/02 (2006.01); G06F 3/04817 (2022.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 3/04883 (2013.01); G06N 5/02 (2013.01); G06F 3/04817 (2013.01);
Abstract

Systems and processes for metric learning distillation are disclosed herein. In accordance with one example, a method includes, at an electronic device, at an electronic device having one or more processors and memory, receiving a first plurality of vectors from a first model, receiving a second plurality of vectors from a second model, determining a first plurality of vector distances based on the first plurality of vectors, generating a first matrix based on the first plurality of vector distances, determining a second plurality of vector distances based on the second plurality of vectors, generating a second matrix based on the second plurality of vector distances, comparing the first matrix with the second matrix, and adjusting the second model based on the comparison of the first matrix and the second matrix.


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