The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
May. 28, 2018
Central Glass Company, Limited, Ube, JP;
Central Glass Company, Limited, Ube, JP;
Abstract
Provided is a fluorine-containing polymer which has no perfluoroalkyl group of 4 or more carbon atoms and which, when formed together with a photoacid generator into a film, shows water repellency after film formation, but becomes hydrophilic by the action of an acid generated under light irradiation, and thus serves as a pattern forming material capable of forming a film with high sensitivity and resolution. A fluorine-containing polymer according to the present invention has a repeating unit of the formula (1) where Ris a hydrogen atom, a fluorine atom or a C-Calkyl group; Rto Rare each independently a hydrogen atom or a C-Calkyl group; X is a single bond or a divalent group; Y is a C-Cfluoroalkyl or carboxylate (—COOR) group; R is a C-Cfluoroalkyl group; and seven or less of hydrogen atoms contained in the substituent group may be substituted with fluorine.