The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

Dec. 21, 2020
Applicant:

Azur Space Solar Power Gmbh, Heilbronn, DE;

Inventors:

Clemens Waechter, Lauffen am Neckar, DE;

Gregor Keller, Heilbronn, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/08 (2006.01); C30B 25/10 (2006.01); C30B 25/16 (2006.01); C30B 29/42 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C30B 25/08 (2013.01); C30B 25/10 (2013.01); C30B 25/165 (2013.01); C30B 29/42 (2013.01); H01L 21/0262 (2013.01);
Abstract

A vapor phase epitaxy method including: providing a III-V substrate of a first conductivity type, introducing the III-V substrate into a reaction chamber of a vapor phase epitaxy system at a loading temperature, heating the III-V substrate from the loading temperature to an epitaxy temperature while introducing an initial gas flow, depositing a III-V layer with a dopant concentration of a dopant of the first conductivity type on a surface of the III-V substrate from the vapor phase from an epitaxial gas flow, fed into the reaction chamber and comprising the carrier gas, the first precursor, and at least one second precursor for an element of main group III, wherein during the heating from the loading temperature to the epitaxy temperature, a third precursor for a dopant of the first conductivity type is added to the initial gas flow.


Find Patent Forward Citations

Loading…