The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

Oct. 19, 2018
Applicant:

Picosun Oy, Espoo, FI;

Inventors:

Vaino Kilpi, Espoo, FI;

Juhana Kostamo, Espoo, FI;

Wei-Min Li, Espoo, FI;

Assignee:

Picosun Oy, Espoo, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45546 (2013.01); C23C 16/4582 (2013.01); C23C 16/4584 (2013.01); H01L 21/67742 (2013.01); H01L 21/67757 (2013.01); H01L 21/67781 (2013.01); H01L 21/68707 (2013.01);
Abstract

An apparatus and method for loading a plurality of substrates into a substrate holder in a loading chamber of a deposition reactor to form a vertical stack of horizontally oriented substrates within said substrate holder, for turning the substrate holder to form a horizontal stack of vertically oriented substrates, and for lowering the substrate holder into a reaction chamber of the deposition reactor for deposition. The technical effects achieved are: a top loading system for a vertical flow deposition reactor in which the substrates can be loaded with horizontal orientation, eliminating the need for flipping each substrate separately by flipping the whole substrate holder and minimizing a loading distance in a reactor cluster.


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