The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
Apr. 11, 2019
Applicant:
Avava, Inc., Boston, MA (US);
Inventors:
Charles Holland Dresser, Wayland, MA (US);
Rajender Katkam, Boston, MA (US);
Jayant Bhawalkar, Auburndale, MA (US);
Assignee:
Avava, Inc., Boston, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
A61B 18/20 (2006.01); A61B 18/22 (2006.01); A61B 18/00 (2006.01);
U.S. Cl.
CPC ...
A61B 18/203 (2013.01); A61B 18/201 (2013.01); A61B 18/22 (2013.01); A61B 2018/00452 (2013.01); A61B 2018/00577 (2013.01); A61B 2018/00636 (2013.01);
Abstract
A method includes generating a plurality of primary beams from a laser beam, and generating, from a primary beam one or more secondary beams. The method also includes focusing the first secondary beam to a first focal region in the target tissue and the second secondary beam to a second focal region in the target tissue. The first focal region and the second focal region can be located at different depths in the target tissue.