The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2022

Filed:

Jun. 03, 2019
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Vrashank Gurudatta Shukla, Plano, TX (US);

Mark Benjamin Welty, McKinney, TX (US);

Lifang Lou, Allen, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/08 (2006.01); H01L 23/495 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/866 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0814 (2013.01); H01L 23/49562 (2013.01); H01L 23/49575 (2013.01); H01L 27/0248 (2013.01); H01L 29/0649 (2013.01); H01L 29/66106 (2013.01); H01L 29/866 (2013.01);
Abstract

An electronic device includes a first-conductivity-type substrate and a second-conductivity-type epitaxial layer having a first dopant concentration. A first substrate region includes a second-conductivity-type buried layer and is enclosed by a first deep isolation structure. Within the first substrate region are a first doped region having the second conductivity type and a dopant concentration greater than the first dopant concentration and a second doped region having the first conductivity type. A second substrate region includes a first-conductivity-type buried layer and is enclosed by a second deep isolation structure. Within the second substrate region is a third doped region having the second conductivity type and a dopant concentration greater than the first dopant concentration.


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