The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Nov. 23, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Hitomi Sakai, Tokyo, JP;
Daisuke Sato, Tokyo, JP;
Keiichiro Hitomi, Tokyo, JP;
Hiroyuki Saito, Tokyo, JP;
Kazuma Tanii, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lensand an objective lensconfigured to focus an electron beamemitted from an electron source, a primary beam scanning deflectoror a secondary electron deflector, an adjusting elementconfigured to adjust an axis of the electron beam, and a control deviceconfigured to supply a signal representing a control amount to the adjusting elementfor control. The control deviceis configured to determine the control amount by using a change amount of an intensity of the condenser lens, the objective lens, the primary beam scanning deflector, or the secondary electron deflector, and a calculation formula or a table showing a relation between the change amount of the intensity and the control amount.