The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2022

Filed:

Feb. 02, 2021
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Norman N. Wang, Saratoga, CA (US);

Tyler L. Casella, San Jose, CA (US);

Benjamin Breckin Loggins, Santa Clara, CA (US);

Daniel M. Delwood, San Jose, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/01 (2006.01);
U.S. Cl.
CPC ...
G06F 3/013 (2013.01);
Abstract

A method includes determining an eye focus depth and determining a focus point relative to a viewing location in a virtual environment based on the eye focus depth, wherein the virtual environment includes a computer-generated object. The method also includes, upon determining that the focus point is located within a threshold distance from the computer-generated object, activating a function of a computer-executable code development interface relative to the computer-generated object.


Find Patent Forward Citations

Wang, Norman. (2022). Focus-based debugging and inspection for a display system (U.S. Patent No. 11275438). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11275438

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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