The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Feb. 28, 2020
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Yukio Oppata, Chiba Chiba, JP;
Kosuke Takai, Yokohama Kanagawa, JP;
Assignee:
KIOXIA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/76 (2012.01); G03F 1/80 (2012.01); G03F 1/78 (2012.01); G03F 1/58 (2012.01); G03F 1/48 (2012.01); G03F 1/32 (2012.01);
U.S. Cl.
CPC ...
G03F 1/32 (2013.01); G03F 1/48 (2013.01); G03F 1/58 (2013.01); G03F 1/76 (2013.01); G03F 1/78 (2013.01); G03F 1/80 (2013.01);
Abstract
A method for manufacturing a photomask includes obtaining a substrate on which a halftone film, a light-shielding film, and a resist film are stacked, irradiating a first region of the resist film at a first dose and a second region of the resist film that surrounds the first region at a second dose greater than the first dose, developing the resist film in the first region to form a mask pattern while leaving the resist film in the second region to form a mask frame pattern, and then patterning the light-shielding film using the mask pattern formed in the resist film.