The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2022

Filed:

Nov. 01, 2017
Applicant:

Unm Rainforest Innovations, Albuquerque, NM (US);

Inventors:

Ravinder Jain, Albuquerque, NM (US);

Abhaya K. Datye, Albuquerque, NM (US);

Ying-Bing Jiang, Albuquerque, NM (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/58 (2006.01); A61K 41/00 (2020.01); A61K 9/51 (2006.01); A61P 35/00 (2006.01); G01N 33/84 (2006.01); G01N 21/65 (2006.01); G01N 21/64 (2006.01); C23C 16/455 (2006.01); B82Y 5/00 (2011.01); B82Y 20/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G01N 33/588 (2013.01); A61K 9/5115 (2013.01); A61K 41/008 (2013.01); A61P 35/00 (2018.01); C23C 16/45525 (2013.01); G01N 21/6489 (2013.01); G01N 21/658 (2013.01); G01N 33/84 (2013.01); B82Y 5/00 (2013.01); B82Y 20/00 (2013.01); B82Y 40/00 (2013.01); Y10S 977/774 (2013.01); Y10S 977/81 (2013.01); Y10S 977/824 (2013.01); Y10S 977/891 (2013.01);
Abstract

A method of making free-standing ALD-coated plasmonic nanoparticles. The method comprises providing a plurality of semiconductor quantum dots. One or more conformal layers of dielectric material are deposited over the quantum dots to form dielectric-coated quantum dots. A conformal metallic nanoshell is deposited over the dielectric-coated quantum dots to form plasmonic nanoparticles. At least one layer chosen from i) the conformal layers of dielectric material and ii) the conformal metallic nanoshell is deposited using a vapor phase atomic layer deposition (ALD) process. Plasmonic nanoparticles and systems employing the nanoparticles are also disclosed.


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