The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Feb. 19, 2019
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Go Ichinose, Fukaya, JP;
Yuichi Shibazaki, Kumagaya, JP;
Assignee:
NIKON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01B 11/27 (2006.01); G03F 1/42 (2012.01); G03F 7/16 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G01B 11/272 (2013.01); G03F 1/42 (2013.01); G03F 7/2022 (2013.01); G03F 7/2041 (2013.01); G03F 7/70633 (2013.01); G03F 7/70775 (2013.01); G03F 9/7011 (2013.01); G01B 2210/56 (2013.01); G03F 7/16 (2013.01); G03F 7/30 (2013.01);
Abstract
A measurement system to be used in a micro-device manufacturing line is equipped with: a plurality of measurement devices which performs measurement processing on each substrate; and a controller that can control the plurality of measurement devices, and the plurality of measurement devices includes at least one first measurement device which acquires position information of a plurality of marks formed on a substrate.
Ichinose, Go. (2022). Measurement system, substrate processing system, and device manufacturing method (U.S. Patent No. 11274919). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11274919
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile