The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2022

Filed:

Mar. 02, 2018
Applicants:

National Institute of Technology, Tokyo, JP;

National University Corporation Yokohama National University, Yokohama, JP;

Kyoto University, Kyoto, JP;

Nisshinbo Holdings Inc., Tokyo, JP;

Inventors:

Takaya Sato, Tsuruoka, JP;

Hiroyuki Arafune, Tsuruoka, JP;

Takashi Morinaga, Tsuruoka, JP;

Saika Honma, Tsuruoka, JP;

Toshio Kamijo, Tsuruoka, JP;

Ken Nakano, Yokohama, JP;

Yoshinobu Tsujii, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 291/06 (2006.01); C08J 3/12 (2006.01); C08L 33/10 (2006.01); C08L 53/00 (2006.01);
U.S. Cl.
CPC ...
C08F 291/06 (2013.01); C08J 3/12 (2013.01); C08L 33/10 (2013.01); C08L 53/00 (2013.01);
Abstract

A composite including a plurality of block copolymer chains dispersed in a base polymer, the block copolymer chains including a polymer block (A) and a polymer block (B) having lower affinity for the base polymer than that of the polymer block (A), wherein each of the block copolymer chains has the polymer block (A) at two or more locations of the block copolymer chain, and in at least some of the block copolymer chains, the polymer blocks (A) are at least partially located in the base polymer and the polymer blocks (B) are at least partially exposed from the base polymer.


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