The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Dec. 02, 2020
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Tomer Haimovich, Tel Aviv, IL;
Noa Esther Aviv Hamamy, Tel Aviv, IL;
Jonatan Zukerman, Kiryat Ono, IL;
Dror Cohen, Tel Aviv, IL;
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
Computing environment resource popularity is assessed, using a computed ratio of accumulations of resource usage values and a relationship condition, thereby providing inputs as guidance for automatic system enhancement utilizations such as anomaly detection, resource management, and access or maintenance prioritization. Unlike V1 approaches that base resource popularity on at most two resource usage values, the V2 assessment approaches taught herein consider a distribution of usage values across an entire group of resources, thereby providing finer grained actionable results. Usage value accumulations may be scaled. Popularity or rareness of one or more resources of various types may be determined. A cache or other decay model may be employed to optimize assessment efficiency by reducing usage value retrieval I/O transactions. Specific utilizations of resource popularity assessments for enhancing system usability, security, functionality, and effectiveness are discussed.