The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Jul. 11, 2019
Lam Research Corporation, Fremont, CA (US);
Jonathan D. Mohn, Saratoga, CA (US);
Nicholas Muga Ndiege, Fremont, CA (US);
Patrick A. van Cleemput, West Linn, OR (US);
David Fang Wei Chen, San Jose, CA (US);
Wenbo Liang, Sherwood, OR (US);
Shawn M. Hamilton, Boulder Creek, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Provided are methods and apparatus for ultraviolet (UV) assisted capillary condensation to form dielectric materials. In some embodiments, a UV driven reaction facilitates photo-polymerization of a liquid phase flowable material. Applications include high quality gap fill in high aspect ratio structures and pore sealing of a porous solid dielectric film. According to various embodiments, single station and multi-station chambers configured for capillary condensation and UV exposure are provided.