The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Feb. 27, 2020
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Naoki Sano, Minami-ashigara, JP;
Eiki Ozawa, Minami-ashigara, JP;
Norihito Kasada, Minami-ashigara, JP;
Takuto Kurokawa, Minami-ashigara, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/706 (2006.01); G11B 5/71 (2006.01); G11B 5/708 (2006.01); G11B 5/735 (2006.01); G11B 5/78 (2006.01); G11B 5/733 (2006.01); G11B 5/008 (2006.01); G11B 5/70 (2006.01);
U.S. Cl.
CPC ...
G11B 5/70678 (2013.01); G11B 5/00813 (2013.01); G11B 5/7013 (2013.01); G11B 5/7085 (2013.01); G11B 5/70615 (2013.01); G11B 5/71 (2013.01); G11B 5/733 (2013.01); G11B 5/735 (2013.01); G11B 5/7356 (2019.05); G11B 5/78 (2013.01);
Abstract
The magnetic recording medium includes: a non-magnetic support; and a magnetic layer including ferromagnetic powder, in which a difference (S−S) between a spacing Smeasured on a surface of the magnetic layer by optical interferometry after n-hexane cleaning under a pressure of 0.5 atm and a spacing Smeasured on the surface of the magnetic layer by optical interferometry after n-hexane cleaning under a pressure of 13.5 atm is 9.0 nm or more.