The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Mar. 20, 2020
Applicant:
Seiko Epson Corporation, Tokyo, JP;
Inventor:
Atsushi Saito, Chino, JP;
Assignee:
SEIKO EPSON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/42 (2006.01); G03H 1/04 (2006.01); G03H 1/22 (2006.01);
U.S. Cl.
CPC ...
G02B 27/4205 (2013.01); G03H 1/0402 (2013.01); G03H 1/2205 (2013.01); G03H 1/2286 (2013.01); G03H 2001/0415 (2013.01); G03H 2001/0439 (2013.01); G03H 2001/2231 (2013.01); G03H 2222/12 (2013.01); G03H 2222/13 (2013.01); G03H 2222/31 (2013.01); G03H 2222/34 (2013.01); G03H 2222/42 (2013.01); G03H 2222/43 (2013.01);
Abstract
A deflection optical element, which diffracts incident light, includes a substrate having translucency, and a holographic material layer disposed so as to overlap the substrate, the holographic material layer being formed with a diffraction grating composed of interference fringes, wherein the holographic material layer is formed with an alignment mark where the interference fringes are discontinuous, and the alignment mark is located in an optically effective area where the holographic material layer diffracts the incident light.