The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Dec. 15, 2015
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Hilmar Laudahn, OT Thalheim, DE;
Klaus-Uwe Badeke, Petersberg-Sennewitz, DE;
Martin Trommer, Bitterfeld, DE;
HERAEUS QUARZGLAS GMBH & CO. KG, Hanau, DE;
Abstract
A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiOparticles through oxidation and/or through hydrolysis, (d) depositing the SiOparticles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiOparticles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m/g. A device for carrying out the method is also provided.