The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Jun. 30, 2017
Covestro Deutschland Ag, Leverkusen, DE;
Andre Rittermeier, Leverkusen, DE;
Rainer Hellmich, Cologne, DE;
Alfred Soppe, Issum, DE;
Luyan Wu, Shanghai, CN;
Micky Qian, Shanghai, CN;
Peter Lehner, Mühlheim an der Ruhr, DE;
Friedhelm Steffens, Leverkusen, DE;
Henrike Fink, Meerbusch, DE;
Eric Jakobs, Krefeld, DE;
Covestro Deutschland AG, Leverkusen, DE;
Abstract
The present invention relates to a method and a system for separating and treating impurities from a hydrogen chloride liquid mixture from the process for preparing isocyanate with phosgenation including sending hydrogen chloride liquid mixture into a gas-liquid separation column for separation to yield a liquid phase flow with impurities at the bottom of the gas-liquid separation column, neutralizing the liquid phase flow comprising impurities with an alkaline liquid in the neutralization tank to yield a neutralized solution, and sending the neutralized solution into a waste liquid treatment device from said neutralization tank for treatment.