The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2022

Filed:

May. 04, 2020
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Masato Murayama, Matsumoto, JP;

Atsushi Yoshida, Matsumoto, JP;

Kazushi Arafuka, Matsumoto, JP;

Mizuki Yokouchi, Okaya, JP;

Masanobu Yamaguchi, Matsumoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/165 (2006.01);
U.S. Cl.
CPC ...
B41J 2/16517 (2013.01); B41J 2/16544 (2013.01); B41J 2002/1655 (2013.01);
Abstract

A liquid ejecting apparatus includes a wiping mechanism that includes a wiping portion configured to move in a wiping direction, in which a first nozzle surface and a second nozzle surface each provided with nozzles of a liquid ejecting portion are aligned, and to wipe the first nozzle surface and the second nozzle surface, and an isolation region in which the wiping portion is not brought into contact with the first nozzle surface and the second nozzle surface when a gap between the first and second nozzle surfaces and the wiping portion in an ejecting direction of liquid from the nozzles is a contact interval at which the first nozzle surface and the second nozzle surface are wiped is provided between the first nozzle surface and the second nozzle surface in the wiping direction.


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