The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Dec. 19, 2017
Applicants:

Tsinghua University, Beijing, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Yu-Dan Zhao, Beijing, CN;

Xiao-Yang Xiao, Beijing, CN;

Ying-Cheng Wang, Beijing, CN;

Yuan-Hao Jin, Beijing, CN;

Tian-Fu Zhang, Beijing, CN;

Qun-Qing Li, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/872 (2006.01); H01L 51/05 (2006.01); H01L 51/00 (2006.01); H01L 51/10 (2006.01); H01L 29/24 (2006.01); H01L 29/417 (2006.01); H01L 29/49 (2006.01); B82Y 10/00 (2011.01); H01L 29/775 (2006.01);
U.S. Cl.
CPC ...
H01L 29/872 (2013.01); B82Y 10/00 (2013.01); H01L 29/0673 (2013.01); H01L 29/0676 (2013.01); H01L 29/24 (2013.01); H01L 29/417 (2013.01); H01L 29/4908 (2013.01); H01L 51/0048 (2013.01); H01L 51/0096 (2013.01); H01L 51/055 (2013.01); H01L 51/0516 (2013.01); H01L 51/0545 (2013.01); H01L 51/0558 (2013.01); H01L 51/0579 (2013.01); H01L 51/102 (2013.01); H01L 29/775 (2013.01); H01L 51/0005 (2013.01);
Abstract

A thin film transistor includes a gate electrode, a insulating medium layer and at least one Schottky diode unit. The at least one Schottky diode unit is located on a surface of the insulating medium layer. The at least one Schottky diode unit includes a first electrode, a semiconductor structure and a second electrode. The semiconductor structure comprising a first end and a second end. The first end is laid on the first electrode, the second end is located on the surface of the insulating medium layer. The semiconducting structure includes a nano-scale semiconductor structure. The second electrode is located on the second end.


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