The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
Jan. 03, 2019
Vanderbilt University, Nashville, TN (US);
Katrina L. Leaptrot, Antioch, TN (US);
Jody C. May, Nashville, TN (US);
John A. Mclean, Nashville, TN (US);
Vanderbilt University, Nashville, TN (US);
Abstract
An ion manipulation device and systems and methods for controlling the ion manipulation device. The ion manipulation device includes a pair of counter-facing surfaces and a plurality of electrodes arranged in one or more linear array on each of the counter-facing surfaces. At least one RF power source is coupled to the electrodes and configured to apply an RF potential to the electrodes to create an electric field that inhibits charged particles from approaching the counter-facing surfaces. At least one DC power source is coupled to the electrodes and configured to apply a DC potential to affect the movement of ions between the counter-facing surfaces in a direction parallel to the counter-facing surfaces. The DC potential and the RF potential are applied to the electrodes simultaneously.