The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Nov. 18, 2019
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Juchang Lee, Seoul, KR;

Seoyoon Choi, Seoul, KR;

Eunsang Kim, Seoul, KR;

Kyu Hwan Kim, Seoul, KR;

Joo Yeon Lee, Seoul, KR;

Hyoung Jun Na, Seoul, KR;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/27 (2019.01); G06F 16/23 (2019.01); G06F 16/22 (2019.01);
U.S. Cl.
CPC ...
G06F 16/273 (2019.01); G06F 16/2282 (2019.01); G06F 16/2379 (2019.01);
Abstract

RTR of a database transaction to a replica table may include receiving replication and transaction commit log entries (representing a database transaction). The replication log entry has a row-ID value, and the row at the replica table has a row-ID value. The replication log entry may be dispatched to a parallel log replayer and the associated transaction commit log entry to a transaction commit log replayer. The row-ID values may be compared, and the replication log entry is replayed at the parallel log replayer based on the comparison. The database transaction may then be committed to the replica table by replaying the associated transaction commit log entry at the transaction log replayer, wherein the database transaction is associated with row-level parallel replay having transactional consistency and DDL replication and reconstruction of a DDL statement at the replica system is associated with one or multiple metadata update log entries.


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