The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Apr. 30, 2019
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Sandra Bracholdt, Dielheim, DE;

Volker Saggau, Bensheim, DE;

Jan Portisch, Bruchsal, DE;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/21 (2019.01); G06F 16/242 (2019.01); G06N 20/00 (2019.01); G06F 16/182 (2019.01); G06F 16/25 (2019.01); G06F 16/901 (2019.01); G06F 16/2457 (2019.01);
U.S. Cl.
CPC ...
G06F 16/212 (2019.01); G06F 16/1827 (2019.01); G06F 16/213 (2019.01); G06F 16/2423 (2019.01); G06F 16/24578 (2019.01); G06F 16/254 (2019.01); G06F 16/9024 (2019.01); G06N 20/00 (2019.01);
Abstract

A method for aligning data model schemas is provided herein. A first schema and a second schema may be received. The schemas may include sets of nodes and links between the nodes. An anchor point between the first schema and the second schema may be received. A source node in the first schema may be identified to be mapped to the second schema. A source distance may be calculated between the source node and the anchor point in the first schema. Option distances may be calculated between the anchor point and the other nodes in the second schema. Penalty scores may be calculated for the option distances. A mapping node may be selected from the nodes in the second schema based on their penalty scores. A new anchor point identifying a correspondence between the source node and the mapping node may be stored.


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