The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
Dec. 11, 2018
Facebook Technologies, Llc, Menlo Park, CA (US);
Austin Lane, Redmond, WA (US);
Tingling Rao, Bellevue, WA (US);
Facebook Technologies, LLC, Menlo Park, CA (US);
Abstract
Embodiments relate to a method of fabricating a nano-sized structure in a resin element by nanoimprint lithography (NIL). The method reduces adhesive failure during NIL demolding by inhibiting polymerization at the interface between the resin element and the template. The method includes depositing a layer of polymerization inhibiting compound onto a surface of the template. The layer of polymerization inhibiting compound has a thickness no more than 10 nanometers. A surface of the template has a nano-sized pattern that mirrors that nano-sized structure. The method further includes pressing the template onto the resin element (or the resin element onto the template) to form the nano-sized structure in the resin element. The process also includes curing the resin element after forming the nano-sized structure and removing the template from the resin element after curing the resin element. The polymerization inhibiting compound prevents adhesive failure during the removing.