The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Oct. 19, 2018
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Dana Craig Bookbinder, Corning, NY (US);

Steven Bruce Dawes, Corning, NY (US);

Richard Michael Fiacco, Corning, NY (US);

Ming-Jun Li, Horseheads, NY (US);

Pushkar Tandon, Painted Post, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 37/014 (2006.01); C03B 37/012 (2006.01); C03B 37/018 (2006.01); C03B 37/027 (2006.01); G02B 6/02 (2006.01);
U.S. Cl.
CPC ...
C03B 37/01446 (2013.01); C03B 37/01262 (2013.01); C03B 37/01453 (2013.01); C03B 37/01807 (2013.01); C03B 37/027 (2013.01); G02B 6/02395 (2013.01); C03B 2201/12 (2013.01); C03B 2201/20 (2013.01); C03B 2207/88 (2013.01);
Abstract

Preparation of halogen-doped silica is described. The preparation includes doping silica with high halogen concentration, sintering halogen-doped silica to a closed-pore state, and subjecting the closed-pore silica body to a thermal treatment process and/or a pressure treatment process. The temperature of thermal treatment is sufficiently high to facilitate reaction of unreacted doping precursor trapped in voids or interstices of the glass structure, but is below temperatures conducive to foaming. Core canes or fibers drawn from halogen-doped silica subjected to the thermal treatment and/or pressure treatment show improved optical quality and possess fewer defects. The thermal treatment and/or pressure treatment is particularly advantageous when used for silica doped with high concentrations of halogen.


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