The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Sep. 15, 2017
Applicants:

Centre National DE LA Recherche Scientifique, Paris, FR;

École Polytechnique, Palaiseau, FR;

Commissariat À L'énergie Atomique ET Aux Énergies Alternatives, Paris, FR;

Inventors:

Catherine Corbel, Le Plessis-Robinson, FR;

Irina Shchedrina, Palaiseau, FR;

Jean-Philippe Renault, Massy, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 31/04 (2006.01); C01B 32/194 (2017.01); C01B 32/156 (2017.01); C01B 32/168 (2017.01); C01B 32/21 (2017.01); C01B 32/152 (2017.01); C01B 32/20 (2017.01);
U.S. Cl.
CPC ...
C01B 32/194 (2017.08); C01B 32/152 (2017.08); C01B 32/156 (2017.08); C01B 32/168 (2017.08); C01B 32/20 (2017.08); C01B 32/21 (2017.08); C01B 2202/22 (2013.01); C01B 2204/22 (2013.01); C01P 2002/54 (2013.01); C01P 2006/20 (2013.01); C01P 2006/40 (2013.01);
Abstract

A process for the nitrogen doping of a material includes a set of carbon atoms in the sphybridization state. The process further includes the material not being oxidized beforehand, then placing the material in contact with dinitrogen. Irradiating the material and the dinitrogen placed in contact with a beam of electrons or of light ions whose energy is greater than or equal to 0.1 MeV, to obtain a material wherein some of the carbon atoms in the sphybridization state is nitrogen-doped.


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