The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Dec. 17, 2019
Applicant:

Robert Bosch Gmbh, Stuttgart, DE;

Inventors:

Eckhard Graf, Gomaringen, DE;

Holger Rumpf, Reutlingen, DE;

Jens Frey, Filderstadt, DE;

Jochen Reinmuth, Reutlingen, DE;

Kurt-Ulrich Ritzau, Tuebingen, DE;

Achim Breitling, Reutlingen, DE;

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B81B 3/00 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00119 (2013.01); B81B 3/0097 (2013.01); B81B 2203/0315 (2013.01); B81B 2207/098 (2013.01); B81C 2201/0132 (2013.01); B81C 2203/0118 (2013.01); B81C 2203/0172 (2013.01);
Abstract

A micromechanical device that includes a silicon substrate with an overlying oxide layer and with a micromechanical functional layer lying above same, which extend in parallel to a main extension plane, a cavity being formed at least in the micromechanical functional layer and in the oxide layer. An access channel is formed in the oxide layer and/or in the micromechanical functional layer which, starting from the cavity, extends in parallel to the main extension plane and in the process extends in a projection direction, as viewed perpendicularly to the main extension plane, all the way into an access area outside the cavity. A method for manufacturing a micromechanical device is also described.


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