The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Oct. 06, 2020
Applicant:

Concept Laser Gmbh, Lichtenfels, DE;

Inventors:

Florian Bechmann, Lichtenfels, DE;

Tobias Bokkes, Untersiemau, DE;

Philipp Schumann, Itzgrund-Schottenstein, DE;

Alexandra Popp, Bad Staffelstein, DE;

Marie-Christin Ebert, Coburg, DE;

Assignee:

CONCEPT LASER GMBH, Lichtenfels, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B33Y 50/02 (2015.01); B29C 64/393 (2017.01); B29C 64/153 (2017.01); B29C 64/165 (2017.01); B33Y 40/00 (2020.01); G06F 30/00 (2020.01); B22F 10/20 (2021.01); B22F 10/00 (2021.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B22F 10/30 (2021.01); B22F 10/10 (2021.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B22F 10/00 (2021.01); B22F 10/20 (2021.01); B29C 64/153 (2017.08); B29C 64/165 (2017.08); B33Y 40/00 (2014.12); B33Y 50/02 (2014.12); G06F 30/00 (2020.01); B22F 10/10 (2021.01); B22F 10/30 (2021.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12);
Abstract

An apparatus for additively manufacturing three-dimensional objects may include a first detection device configured to detect a first process parameter during operation of the apparatus, and to generate a first data set comprising information relating to the first process parameter, a second detection device configured to detect a second process parameter during operation of the apparatus, and to generate a second data set comprising information relating to the second process parameter; and a data processing device configured to determine a mutual dependency between the first process parameter and the second process parameter based at least in part on the first data set and the second data set. The mutual dependency may include a possible influence or a real influence of the first process parameter on the second process parameter. The first process parameter may include a chemical parameter and/or a physical parameter of an atmosphere within a process chamber of the apparatus. The second process parameter may include a chemical parameter, a geometrical parameter, and/or a physical parameter of build material during operation of the apparatus.


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