The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2022

Filed:

Dec. 16, 2020
Applicant:

Industry-university Cooperation Foundation Hanyang University, Seoul, KR;

Inventors:

Jin Pyo Hong, Seoul, KR;

Gwang Ho Baek, Incheon, KR;

Ah Rahm Lee, Gimhae-si, KR;

Tae Yoon Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); G11C 13/00 (2006.01); H01L 29/732 (2006.01); G11C 11/56 (2006.01); H01L 29/417 (2006.01); H01L 29/66 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1266 (2013.01); G11C 11/5614 (2013.01); G11C 13/0011 (2013.01); H01L 27/2454 (2013.01); H01L 29/417 (2013.01); H01L 29/66 (2013.01); H01L 29/732 (2013.01); H01L 45/00 (2013.01); H01L 45/1206 (2013.01); H01L 45/1233 (2013.01); H01L 45/145 (2013.01); H01L 45/1658 (2013.01); G11C 2213/15 (2013.01); G11C 2213/52 (2013.01); G11C 2213/53 (2013.01);
Abstract

Disclosed are a switching atomic transistor with a diffusion barrier layer and a method of operating the same. By introducing a diffusion barrier layer in an intermediate layer having a resistance change characteristic, it is possible to minimize variation in the entire number of ions in the intermediate layer involved in operation of the switching atomic transistor or to eliminate the variation to maintain stable operation of the switching atomic transistor. In addition, it is possible to stably implement a multi-level cell of a switching atomic transistor capable of storing more information without increasing the number of memory cells. Also, disclosed are a vertical atomic transistor with a diffusion barrier layer and a method of operating the same. By producing an ion channel layer in a vertical structure, it is possible to significantly increase transistor integration.


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