The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2022
Filed:
Jul. 29, 2019
National Chung-hsing University, Taichung, TW;
National Chung-Hsing University, Taichung, TW;
Abstract
A method for repairing etching damage on a nitride-based epitaxial layer of an optoelectronic device and an optoelectronic device attributable thereto are provided. The method includes: providing a nitrogen-containing working liquid and a annealing apparatus having a reaction chamber; heating the reaction chamber to a predetermined temperature; atomizing the nitrogen-containing working liquid, and introducing the thus formed nitrogen-containing spray into the reaction chamber; and subjecting the optoelectronic device to an annealing treatment in the reaction chamber in the presence of the nitrogen-containing spray, so as to repair the etching damage on the nitride-based epitaxial layer.