The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2022
Filed:
Sep. 30, 2019
Applicant:
Uchicago Argonne, Llc, Chicago, IL (US);
Inventors:
Matthias John Young, Lemont, IL (US);
Steven Payonk Letourneau, Naperville, IL (US);
Devika Choudhury, Naperville, IL (US);
Jeffrey W. Elam, Elmhurst, IL (US);
Angel Yanguas-Gil, Northbrook, IL (US);
Anil U. Mane, Lemont, IL (US);
Assignee:
UChicago Argonne, LLC, Chicago, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31116 (2013.01); H01L 21/0228 (2013.01); H01L 21/0272 (2013.01); H01L 21/02178 (2013.01); H01L 21/02205 (2013.01); H01L 21/0331 (2013.01); H01L 21/31138 (2013.01);
Abstract
A method of etching an organic or hybrid inorganic/organic material. The method etches molecular layer deposition coatings. An etching cycle comprises a first half reaction exposing the coating to a precursor. A second half reaction exposes a second precursor, removing or etching a portion of the coating.