The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2022

Filed:

May. 12, 2021
Applicants:

Zhongwei Chen, Los Altos Hills, CA (US);

Xiaoming Chen, Sunnyvale, CA (US);

Daniel Tang, Fremont, CA (US);

Liang-fu Fan, Fremont, CA (US);

Inventors:

Zhongwei Chen, Los Altos Hills, CA (US);

Xiaoming Chen, Sunnyvale, CA (US);

Daniel Tang, Fremont, CA (US);

Liang-Fu Fan, Fremont, CA (US);

Assignee:

BORRIES PTE. LTD., Singapore, SG;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/153 (2006.01); H01J 37/147 (2006.01); H01J 37/14 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/14 (2013.01); H01J 37/1474 (2013.01); H01J 37/153 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1534 (2013.01);
Abstract

The present invention provides an electrode assembly comprising two or more electrodes arranged around a primary axis forming a non-cylindrical channel space. General electronic apparatus/device, particularly apparatus of charged-particle beam such as electron microscope, may use the electrode assembly to create an optimized pattern of electrical field within non-cylindrical channel space. When the electrode assembly is used as a beam deflector in a magnetic objective lens, the electrical field within the central channel space can be co-optimized with the magnetic field for reducing aberration(s) such as distortion, field curvature, astigmatism, and chromatic aberration, after the beam passes through the central channel space.


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