The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2022
Filed:
Jul. 14, 2016
Applicant:
Hitachi High-technologies Corporation, Tokyo, JP;
Inventors:
Kengo Asai, Tokyo, JP;
Hiroyasu Shichi, Tokyo, JP;
Toru Iwaya, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Assignee:
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/305 (2006.01); H01J 37/09 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 37/09 (2013.01); H01J 37/3053 (2013.01); H01J 2237/0473 (2013.01);
Abstract
To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.